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Corresponding Author

Osama A. Shabaek

Authors ORCID

https://orcid.org/0009-0003-5207-9881

Document Type

Original Article

Subject Areas

Physics

Keywords

Atmospheric pressure plasma, Chemical kinetics, Gas discharge simulation, Global model

Abstract

In the present paper, we have proposed a chemical kinetic global model to simulate discharge systems with He, working gas, in the existence of different humidity levels. Comparing model results and simulation and experiment in literature establishes satisfaction of model results in qualitative and quantitative levels. The effect of varying model input parameters on densities of OH, H2O2, and HO2 has been investigated. Rising input power increases the yield of the system but raising it over 2W has a minor benefit. Keeping the gas temperature at 300 K has a negligible effect on yield of OH and H2O2 and small one on HO2. Increasing gap distance has decreasing effect on yield, so tradeoff between yield and treated amount of gas would be preferable. We suggest using many devices in parallel to rise treatment rate. Gas flow rate changes the distribution of yield species, so varying it according to desired application is preferable.

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